(주)나오텍크

• V-1
• V-4

V-1. SRN-110 SPUTTERING SYSTEM

V-1. SRN-110 SPUTTERING SYSTEM

■ Six-sided transport chamber ( eight-sided option )

■ Two vacuum cassette loadlocks with automatic doors

■ Robotic arm for wafer handling

■ Isolation valves

■ Integrated wafer alignment module

■ Capacity to four independent process chambers

■ Available to RF and DC process

■ Full erosion target surface

□ Low particle process

□ Long target life time

■ High vacuum pumping system ( turbo or cryo pump )