SPEED-150 SPUTTERING SYSTEM
SPEED-150 SPUTTERING SYSTEM
■ Continuously Process
■ Available to multi-layer deposition
■ Available to pre-cleaning or preheating
■ Available to RF and DC process
■ High vacuum pumping system (Turbo or Cryo pump )
■ Control S/W : PLC + Windows NT / C++ based software
| Chamber Size | 750H x 270W | 920H x 800W | 2000H x 1500W | 2300H x 1800W | 3400H x 2800W |
|---|---|---|---|---|---|
| Taget Size | 20＂x 3.5＂ | 25＂x 5＂ | 45＂x 5＂ | 56＂x 5＂ | Rotary Cathode |
| Applied Power | DC, RF, MF, Pulsed DC | ||||
| Cathode Quantity | Variable | ||||
| Process Gas | Process dependence(option) | ||||
| Heating | Process dependence(option) | ||||
| Pre-Cleaning | Process dependence(option) | ||||
| System Control | PC Control | ||||
