Sputtering System

SPEED-150 SPUTTERING SYSTEM

SPEED-150 SPUTTERING SYSTEM

■ Continuously Process

■ Available to multi-layer deposition

■ Available to pre-cleaning or preheating

■ Available to RF and DC process

■ High vacuum pumping system (Turbo or Cryo pump )

■ Control S/W : PLC + Windows NT / C++ based software

Chamber Size 750H x 270W 920H x 800W 2000H x 1500W 2300H x 1800W 3400H x 2800W
Taget Size 20"x 3.5" 25"x 5" 45"x 5" 56"x 5" Rotary Cathode
Applied Power DC, RF, MF, Pulsed DC
Cathode Quantity Variable
Process Gas Process dependence(option)
Heating Process dependence(option)
Pre-Cleaning Process dependence(option)
System Control PC Control

제품소개

문의안내
  • phone number TEL. 031-357-6283
    제품문의. 010-4772-2790
  • phone number FAX. 031-357-6287
  • Email address

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